Ion Beam Processing: Overview

The use of ion beam processing technology is critical to many high performance thin film applications. Processes which utilize ion beam processing include ion beam sputter deposition, ion assisted deposition, and substrate cleaning, etching, and oxidation.

Broad beam ion sources are capable of producing directed beams of singly charged ions with energies ranging from a few eV to 1000 eV. Ion sources are available in a variety of configurations including gridded DC and RF ion sources as well as gridless end-Hall type sources.

Aeres®, Angstrom’s advanced process controls software, has been specifically configured with features and capabilities unique to ion beam processing. Click here to learn more.

To continue exploring more in Ion sources and deposition, please follow the links below.

Discover More…

Ion Assisted DepositionIon Beam Etching & CleaningIon Beam Sputter Deposition (IBSD)

Ion Beam Processing Available on:

Can Ion Beam Processing Help?

We can get you answers quickly and efficiently, let’s talk about your work.

How can we help you achieve your goals? What technical obstacles can our engineering team help you overcome? Please press the ‘Get in Touch’ button to get in contact with us, we’d be excited to hear about your research and help you in any way we can.