Ion Beam Processing: Overview
The use of ion beam processing technology is critical to many high performance thin film applications. Processes which utilize ion beam processing include ion beam sputter deposition, ion assisted deposition, and substrate cleaning, etching, and oxidation.
Broad beam ion sources are capable of producing directed beams of singly charged ions with energies ranging from a few eV to 1000 eV. Ion sources are available in a variety of configurations including gridded DC and RF ion sources as well as gridless end-Hall type sources.
Aeres, Angstrom’s advanced process controls software, has been specifically configured with features and capabilities unique to ion beam processing. Click here to learn more.
To continue exploring more in Ion sources and deposition, please follow the links below.
Discover More…Ion Assisted DepositionIon Beam Etching & CleaningIon Beam Sputter Deposition (IBSD)
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