Low Pressure Chemical Vapor Deposition System
Designed and manufactured to meet the high temperature and rapid cooling requirements of graphene and CNT research, Angstrom’s LPCVD (Low Pressure Chemical Vapor Deposition) system will fit in nicely in your lab.
We engineered a water-cooled furnace that can reach 1100°C in 10 minutes, as well as cool down below 800°C in a mere 2 minutes. Controlled graphene growth is ensured, and processing times are kept to a minimum with the Low Pressure Chemical Vapor Deposition system. Various chamber tube sizes are available between Ø 2 in and Ø 8 in allowing processing of single small samples up to batches in 6-inch wafers.
The tool you need to study and utilize Graphene and Carbon Nanotubes
Operation and Safety
Aeres® Advanced Process Control Software
From the time it was delivered, this laboratory system has performed nearly flawlessly, arguably extending our capabilities well beyond those currently attainable by any organic thin film laboratory in the world. I attribute the success of this entire system to the excellence of the engineering as well as the cooperative nature of the Angstrom team in taking our best designs and making them better during the system construction process.
Dr. Stephen Forrest – University of Michigan
WE WANT TO HEAR ABOUT YOUR PROCESS!
Please get in touch and we can collaborate on your project
When we work together, amazing things can happen. Your brilliant ideas with our innovative team will create the tool that will bring your research or production to the next level. We’re looking forward to hearing from you: