Whether heating a substrate during oxide sputtering to ensure the correct crystal structure and stoichiometry or cooling a deposited organic film to protect from process radiation, the ability to accurately and precisely manage substrate temperature is critical for the performance of a deposition system.
At Angstrom Engineering®, we carefully design the appropriate hardware, electronics, and control software to provide robust and high-performance temperature management.
Our heating and cooling stages employ precise temperature measurement techniques that do not interfere with film growth, plasma, and/or substrate transfer. These techniques have proven accurate and reliable, allowing our partners’ confident control of this process variable.
We regularly create temperature-controlled substrate stages that can achieve between -150°C and 1000°C.
"This instrument is a workhorse for a number of research groups in Tulane’s School of Science and Engineering. Please keep up the great work in providing support quickly, professionally, and with strong technical know-how. I’m glad to work with Angstrom."
Dr. Matthew Escarra
Tulane University