Nexdep

This PVD platform offers a balance between economy and versatility.  It can be outfitted with the most robust process enhancements without taking up all the room in your lab or your budget.

4 iterations of Nexdep, Angstrom Engineering's versatile workhorse physical vapor deposition evaporator.  It can be outfitted any number of ways depending on your process requirements.
2017 model of the Nexdep Physical vapor deposition pvd evaporator platform

With its 400mm x 400mm baseplate, your Nexdep can accomodate up to 8 sources and wide variety of PVD processes.  Your research goals, production demands, and/or application end-goals will inform how to outfit your Nexdep.  Let’s work together to design the system that will be perfectly suited to your requirements.

A Compact, economical, full featured PVD workhorse


Electron Beam ebeam e-beam source in a Physical vapor deposition pvd vacuum chamber evaporator
  • Deposition Source Options

Sputtering 
RF, DC, pulsed DC, HIPIMS, and reactive. Circular, linear & cylindrical cathodes are available.

Thermal Evaporation 
You can utilize a wide range of boats, filaments & crucible heaters. Auto-tuning ensures precise rate control.

Electron Beam Evaporation 
A wide range of of source power and power supply options are available. Programmable sweep controller with recipe storage is controlled through Aeres software platform. A torque sensing crucible indexer detects pocket jams. There is room for multiple e-beam sources in the Nexdep chamber.

Plasma & Ion Beam Processing 
We use a range of ion sources for cleaning and film enhancements, including glow discharge plasma cleaning.



  • Aeres Advanced Process Control Software

Screenshot of Aeres, a software platform that supports Angstrom Engineering's Physical vapor deposition systems
  • Simple to use yet highly sophisticated
  • PC/PLC controlled recipes for single, batch, or automated processes
  • Advanced data logging and process tracking ensure consistent and repeatable processes
  • High resolution control provides impressive low rate stability and consistent doping ratios
  • Central control station manages each module and schedules the processes in each chamber
  • Independent control of multiple chambers (if applicable)
  • Complex recipes can be created and modified easily
  • Automatic PID control loop tuning significantly reduces process development time

Angstrom Engineering is as close to an ‘easy button’ for PVD as one can get.

Tony Novembre – Associate Director – PRISM | Princeton University


This video outlines one instance where we worked closely with our partner to provide a unique process solution

Would Nexdep help bring your ideas to life?

Please get in touch and we can collaborate on your project

When we work together, amazing things can happen. Your brilliant ideas with our innovative team will create the tool that will bring your research or production to the next level. We’re looking forward to hearing from you:

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