This PVD platform offers a balance between economy and versatility. It can be outfitted with the most robust process enhancements without taking up all the room in your lab or your budget.
With its 400mm x 400mm baseplate, your Nexdep can accommodate up to 8 sources and wide variety of PVD processes. Your research goals, production demands, and/or application end-goals will inform how to outfit your Nexdep. Let’s work together to design the system that will be perfectly suited to your requirements.
A Compact, economical, full featured PVD workhorse
Deposition Source Options
RF, DC, pulsed DC, HIPIMS, and reactive. Circular, linear & cylindrical cathodes are available.
You can utilize a wide range of boats, filaments & crucible heaters. Auto-tuning ensures precise rate control.
Electron Beam Evaporation
A wide range of source power and power supply options are available. Programmable sweep controller with recipe storage is controlled through Aeres software platform. A torque sensing crucible indexer detects pocket jams. There is room for multiple e-beam sources in the Nexdep chamber.
Plasma & Ion Beam Processing
We use a range of ion sources for cleaning and film enhancements, including glow discharge plasma cleaning.
Substrate Fixturing Enhancements
Substrate and Shadow Mask Automation Options
Aeres Advanced Process Control Software
Angstrom Engineering is as close to an ‘easy button’ for PVD as one can get.
Tony Novembre – Associate Director – PRISM | Princeton University
This video outlines one instance where we worked closely with our partner to provide a unique process solution
Would Nexdep help bring your ideas to life?
Please get in touch and we can collaborate on your project
When we work together, amazing things can happen. Your brilliant ideas with our innovative team will create the tool that will bring your research or production to the next level. We’re looking forward to hearing from you: