Box Coater

Large box chambers are perfect for depositing onto large area substrates or batches of many smaller substrates. The increased height of these chambers provides excellent film thickness uniformity, while increases to the width and depth provide space for advanced fixturing options. All box coater system configurations are computer modeled to optimize film uniformity, material yield, and throughput.

EvoVac Physical vapor deposition pvd evaporator platform

With its customizably large baseplate and dimensions, your Angstrom Engineering Box Coater can accommodate a variety of sources and PVD processes.  Your research goals, production demands, and/or application end-goals will inform how to outfit your Box Coater.  Let’s work together to design the system that will be perfectly suited to your requirements.

Big Chambers. Big Progress.


  • Deposition Source Options

Sputtering 
RF, DC, pulsed DC, HIPIMS, and reactive. Circular, linear & cylindrical cathodes are available.

Thermal Evaporation 
You can utilize a wide range of boats, filaments & crucible heaters. Auto-tuning ensures precise rate control.

Electron Beam Evaporation 
A wide range of source power and power supply options are available. Programmable sweep controller with recipe storage is controlled through Aeres software platform. A torque sensing crucible indexer detects pocket jams. There is room for multiple e-beam sources in the Box Coater chamber.

Plasma & Ion Beam Processing 
We use a range of ion sources for cleaning and film enhancements, including glow discharge plasma cleaning.



  • Aeres Advanced Process Control Software

Screenshot of Aeres, a software platform that supports Angstrom Engineering's Physical vapor deposition systems
  • Batch coating automation is managed with Aeres for excellent process control and reapeatability
  • PC/PLC controlled recipes for single, batch, or automated processes
  • Advanced data logging and process tracking ensure consistent and repeatable processes
  • High resolution control provides impressive low rate stability and consistent doping ratios
  • Central control station manages each module and schedules the processes in each chamber
  • Independent control of multiple chambers (if applicable)
  • Complex recipes can be created and modified easily
  • Automatic PID control loop tuning significantly reduces process development time

Angstrom Engineering has worked to make their equipment highly functional, but not overly complex to use. Whenever I call I get immediate assistance. In an extremely busy facility like Princeton’s MNFL, these qualities have made Angstrom my first choice for PVD tools.

Joe Palmer – MNFL – Princeton University

IS A BOX COATER THE RIGHT SYSTEM FOR YOUR LAB? 
Talk to us about it. You’ll get answers efficiently.

When we work together, amazing things can happen. Your brilliant ideas with our innovative team will create the tool that will bring your research or production to the next level. We’re looking forward to hearing from you:

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