Box Coater PVD Platform

Box Coater is a flexible, cleanroom compatible coating platform capable of low to high volume production of 100 mm to 1200 mm substrates, and/or batch production of smaller parts. The form factor provides excellent film thickness uniformity and has plenty of space for advanced fixturing options. All Box Coater platform configurations are capable of active modeling and correction of film thickness non-uniformity, material yield, and throughput.

EvoVac Physical vapor deposition pvd evaporator platform

With its customizable baseplate and dimensions, Box Coater PVD (physical vapor deposition) platform can accommodate a variety of sources, processes, and substrate fixturing solutions. Your research goals, production demands, and/or application end-goals will inform how to outfit your Box Coater. It is well-suited for a variety of applications, including metallization, optical coatings, sensing, and indium bump bond fabrication. Let’s work together to design the system that will perfectly suit your requirements.

  • Deposition Source Options

RF, DC, pulsed DC, HIPIMS, and reactive. Circular, linear & cylindrical cathodes are available.

Thermal Evaporation 
You can utilize a wide range of boats, filaments & crucible heaters. Auto-tuning ensures precise rate control.

Electron Beam Evaporation 
With the Box Coater PVD platform, a wide range of source power and power supply options are available. Programmable sweep controller with recipe storage is controlled through Aeres software platform. A torque sensing crucible indexer detects pocket jams. There is room for multiple e-beam sources in the Box Coater chamber.

Plasma & Ion Beam Processing 
We use a range of ion sources for cleaning and film enhancements, including glow discharge plasma cleaning.

Box Coater production device throughput optoelectronics fabrication

View this demonstration of a recent (2024) Box Coater project we created for commercial partners producing large batches of optoelectronic devices.

  • Aeres® Advanced Process Control Software

Screenshot of Aeres, a software platform that supports Angstrom Engineering's Physical vapor deposition systems
  • Batch coating automation is managed with Aeres for excellent process control and repeatability
  • PC/PLC controlled recipes for single, batch, or automated processes
  • Advanced data logging and process tracking ensure consistent and repeatable processes
  • High resolution control provides impressive low rate stability and consistent doping ratios
  • Central control station manages each module and schedules the processes in each chamber
  • Independent control of multiple chambers (if applicable)
  • Complex recipes can be created and modified easily
  • Automatic PID control loop tuning significantly reduces process development time

Angstrom Engineering has worked to make their equipment highly functional, but not overly complex to use. Whenever I call I get immediate assistance. In an extremely busy facility like Princeton's MNFL, these qualities have made Angstrom my first choice for PVD tools.

Joe Palmer - MNFL - Princeton University

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When we work together, amazing things can happen. Your brilliant ideas with our innovative team will create the tool that will bring your research or production to the next level. We're looking forward to hearing from you: