Ion Assisted Deposition
In ion-assisted deposition (IAD), an ion source directs a dispersed beam with a range of ion energies toward the substrate. The beam goes through the deposition stream and imparts energy to the particles therein.
The effect of this is to increase the mobility of molecules or atoms, leading to increased grain size, improved film density, and optimized step coverage. Ion-assisted deposition can improve your process capabilities.
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Dr.Trisha Andrew
University of Massachusetts Amherst