Ion Beam Etching & Cleaning

Ion beam cleaning is a process in which a beam of energetic ions is directed towards a substrate with the intent of removing contaminants. Removal of these contaminants enhances adhesion properties and improves the interface between the film and the substrate. In ion beam etching, the energy of the ions is larger and capable of sputtering material from the surface of the substrate. Ion beam etching can be used to thin layers, or define features through a mask.


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This instrument is a workhorse for a number of research groups in Tulane’s School of Science and Engineering.
Please keep up the great work in providing support quickly, professionally, and with strong technical know-how. I’m glad to work with Angstrom.

Dr. Matthew Escarra¬† –¬†Tulane University