Ion Beam Etching & Cleaning
Ion beam cleaning is a process in which a beam of energetic ions is directed towards a substrate with the intent of removing contaminants. Removal of these contaminants enhances adhesion properties and improves the interface between the film and the substrate. In ion beam etching, the energy of the ions is larger and capable of sputtering material from the surface of the substrate. Ion beam etching can be used to thin layers, or define features through a mask.