Automation

Automation

Overview

Aeres Control Software

Cluster Integration

Load Locks

Substrate Transfer

Mask Handling

Recipe & Automation  Software

Powerful enough for the most advanced user and complex recipes, yet simple enough for every user in the lab.

With 25 years of experience helping our partners achieve their process requirements, we created Aeres®, a software platform that solves many known limits in thin film deposition technology.  When Aeres® is partnered with one of our PVD platforms, you have an intelligent tool that will save you a lot of time, effort, and resources.

Layer Transition Efficiency

  • Total device time is dramatically reduced due to Aeres®’s ability to manage tasks in parallel.
  • Parallel task management is the automatic and simultaneous control of background processing, including source preparation, mask and sample transfer, power and temperature ramping, and stage preparation.
  • Our partners report a 45% reduction in transition times, and a 30% improvement in overall device fabrication time, as seen below.

Recipe Control

Create processes as simple or as complex as desired.
  • Use the loaded templates to use or build custom sequences from scratch.
  • Build recipes from a remote PC, then seamlessly transfer recipes to the deposition system PC.
  • Aeres® can run entirely autonomously, or you can build manual control into recipes if desired.
  • The unified data management system collects and logs all pertinent process information.
    Pre-Deposition

    Wafer prep, source ramp-up, and stabilization.

    Layer Control

    Thickness, rate, shuttering, and source idling.

    Stage Control

    Heating, cooling, rotation, angle, and biasing.

    Gas and Pressure

    Pressure stability and precise gas delivery

    Automation

    Press start and leave the system to perform all aspects of process runs, with precise repeatability.

    Advanced Deposition Control

    • Aeres® allows our partners to achieve impressive low rate stability.
    • User adjustable PID detection algorithm (auto-tuning).
    • No need to manually tune PID values or spend time doing simulation runs.
    • Significantly reduces process development time.

    Partner with Angstrom Engineering® 

    • Built on .NET infrastructure and is SECS/GEM ready

    • Once recipe is sent to PLC, safety interlocks, vacuum operation, film growth, and wafer manipulation are all executed by the controller, regardless of whether PC is connected or running

    • Runs on a Windows® PC, and is touch-screen compatible

    • Complete and thoroughly tested safety and interlock system

    • The unified data management system collects and logs all pertinent process information

    • Single terminal can control multiple chambers, each with unique recipes

    • Full process, training and troubleshooting support from the Angstrom Engineering® team

    Dr. Matthew White
    University of Vermont

    The Angstrom system has revolutionized our workflow. We are much more confident in our processing and can push true scientific boundaries without worrying about the possibility that some technical detail will throw the experiment off. Angstrom Engineering® has been wonderful to work with. The instrument and customer service are by far the best. Aeres® process control software provides among the best control I’ve ever worked with. Learning to use the software was intuitive and straightforward. It was immediately easy to produce the desired deposition in a highly reproducible way.