In Ion Assisted Deposition (IAD), an ion source directs a dispersed beam with a range of ion energies toward the substrate. The beam goes through the deposition stream and imparts energy to the particles therein. The effect of this is to increase the mobility of molecules or atoms leading to increased grain size, improved film density, and optimized step coverage.

Ion Assisted deposition can improve your process capabilities. Angstrom Engineering’s software solutions allow for precise control of these simultaneous processes.