Ion Assisted Deposition

In Ion Assisted Deposition (IAD), an ion source directs a dispersed beam with a range of ion energies toward the substrate. The beam goes through the deposition stream and imparts energy to the particles therein. The effect of this is to increase the mobility of molecules or atoms leading to increased grain size, improved film density, and optimized step coverage.

Ion Assisted deposition can improve your process capabilities. Angstrom Engineering’s software solutions allow for precise control of these simultaneous processes.

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The most efficient way to determine your needs is to speak with one of our application specialists.

We look forward to discussing this with you.

Go with Angstrom! It’s an easy choice. They have quality equipment, they have good people, and they have really great follow through; they won’t sell you a system and then forget about you. It’s a solid, good product, and great company to work with.

Dr. Trisha Andrew – UMass Amherst