Thin film deposition includes a number of technologies associated with growing layers of materials on a substrate with thicknesses that can range from less than 1 nm to several microns. Our vacuum equipment is tailored by a team of engineers to meet each client’s needs and is capable of incorporating any (or all) of the following:
The impact of high energy particles contained in a plasma eject atoms from the surface of a target material, which then condense on the surface of the substrate to create a thin film.
Electron Beam Evaporation
A filament emits a magnetically focused, high energy beam that is swept within a crucible of deposition material.
Resistive Thermal Evaporation
Electrical current is used to heat a filament, which in turn heats deposition material to the point of evaporation.
Optical Thin Film Control
Our optical control package can be integrated into our PVD platforms.
Glove Box Integration
Allows PVD and non-PVD processes to be connected within a controlled environment.
Variable Angle Stages
Deposit into the third dimension with this novel process enhancement.
Ion Assisted Deposition
A broad beam ion source directs a dispersed ion beam with a range of ion energies toward the substrate, typically along with a sputter or electron beam source.
Process Enhancement Technologies
So many different enhancements are available for your deposition platform.