Angstrom Engineering | Sputter Systems

We’ve been building sputter deposition systems for over 25 years, and would be happy to provide you with our invaluable process expertise.

You create the future. We’ll handle logistics.

Angstrom Engineering makes reliable sputter deposition systems utilizing all available magnetron technology. These systems are well thought out, easy to use, and strongly supported by our team. For research and product applications that require thin film deposition technology, an Angstrom system in your lab will allow you and your team to focus on the work without worrying about your equipment.

Sputter Processes

RF, DC, and Pulsed DC Sputtering

Depending on the material and application requirements, you can utilize the power framework that best suits your processes. We have a mountain of experience in each, and your work will benefit as a result. More here.


In HIPIMS, a train of short, intense pulses is delivered to the cathode. During a pulse, a very high – often kilowatt or megawatt – peak power creates an extremely dense plasma. To avoid the problem of excess heat, the pulses are delivered with a very low duty cycle which keeps heat, as well as the average operating power, at very manageable levels. More here.

Linear Magnetron Sputtering

Linear magnetron sputter systems are designed both for thin films of semiconductors or metals on large area panels as well as for production throughput requiring a high rate of deposition on a quantity of samples. The strategy is most commonly used in display, photovoltaic, and semiconductor applications. In-line sputtering is particularly useful for depositing large areas of transparent conductive oxides (TCOs). More here.

Reactive Gas Sputtering

Reactive DC sputter deposition – wherein a metallic target is sputtered in an environment with a controlled partial pressure of reactive gas – can permit higher deposition rates and more precisely controlled film stoichiometry when compared to RF sputter deposition of native oxide, nitride, or oxynitride films. More here.

Low Damage Sputtering

Highly energetic particles tend to damage sensitive substrates. If your layer requires a gentler approach, we have successfully implemented a number of techniques to ensure the plasma that has access to the substrate will cause less damage. More here.

Ion Beam Sputter Deposition

Optical films require the purity and density that only ion beam sputter deposition (IBSD) can deliver. Angstrom’s Reticle platform is equipped with the process technology to produce the best films, as well as in-situ optical monitoring or spectroscopic ellipsometry to provide the ultimate precision for even the most complex optical coatings. More HERE.


Aeres® is Angstrom’s advanced process control software. It provides the brain to our deposition systems, and has been built utilizing a modern user interface specifically for today’s most demanding thin film users and labs. This recipe based software platform takes care of every process in the system, freeing the user to focus on their innovative work. Tasks are handled in parallel, significantly reducing total fabrication times, resulting in higher throughput and productivity. Additional automated capabilities — like multiple substrate and mask cassettes in in-situ load lock chambers, automatic robotic transfer, and cluster integration —  can be implemented on your system.

Modern User Interface

Multi-substrate/mask cassettes

Robotic Transfer

Cluster Integration

Substrate Fixturing

There is a whole world of technologies that can add capabilities to your thin film deposition system. Some influence thin film properties like adhesion, density, and purity, while others increase efficiency and throughput. With over 600 systems in the field all over the world, we have extensive experience with each.

Twin Blade Masking Shutter

Substrate Tilting and Rotation

Substrate biasing

Roll to Roll

Heated & Cooled Substrates


From the time it was delivered, this laboratory system has performed nearly flawlessly, arguably extending our capabilities well beyond those currently attainable by any organic thin film laboratory in the world. I attribute the success of this entire system to the excellence of the engineering as well as the cooperative nature of the Angstrom team in taking our best designs and making them better during the system construction process.

Dr. Stephen Forrest – University of Michigan

The EvoVac design is terrific and the glovebox port is easy to work with.  Last year, it was used 2269 hours, averaging over 6 hours a day every day of the year.  It is the single most used piece of equipment at our facility, and essential to numerous research projects.  As such, it is critical that downtime is minimized.  The support Angstrom Engineering provides for service issues is exceptional, and unparalleled.  My job would be significantly easier if I received the customer support Angstrom offers for the other instruments in our facility.

Dr. Ina Martin – Case Western University

The two deposition systems we purchased from Angstrom Engineering (EvoVac and NexDep) are being heavily used in our 300-user clean room lab in various research projects and applications. The systems are ‘workhorses’, highly reliable and user friendly. Working with Angstrom Engineering has been a pleasure to me and my staff and we are very happy we chose to purchase our deposition systems from your company.

Dr. Nava Ariel-Sternberg – Director of Columbia Nano Initiative Facilities – Columbia University

Please get in touch and we can collaborate on your project
When we work together, amazing things can happen. Your brilliant ideas with our innovative team will create create the tool that will bring your research or production to the next level. We’re looking forward to hearing from you:

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