Magnetron Sputtering | Physical Vapor Deposition Systems from Angstrom Engineering

Angstrom Engineering is a leading developer of sputter coating systems as well as other physical vapor deposition (PVD) machines. These are used for research and product applications that require thin film deposition technology. Our partners use our systems to drive cutting-edge progress in a variety of industries, including:

Dual magnetron sputter cathodes with plasma during active process
  • Renewable Energy
  • Organic Electronics and display technology (OLED)
  • Photonics and Spintronics
  • Low and high orbit space equipment
  • Various optical and tribological applications
  • Microelectromechanical systems (MEMS)

What sets Angstrom Engineering Apart?

Our team is driven by a commitment to service and partnership with our customers.  We work closely with you, our partner, to provide a sputter coater or any other thin film solutions that you may require.

This video showcases our partner Dr. Trisha Andrew explaining why she trusts Angstrom Engineering.

  • What is Magnetron Sputtering?

Magnetron Sputtering is a PVD coating technology. Sputtering is just one way to deposit materials, but it is ideal for creating contact layers used in thin film photovoltaics, organic light emitting diodes (OLED) thin films transistors, and many others. Sputtering is one of the most used methods of deposition becauseit is scalable to large production and because it can deposit oxides and other compounds while maintaining elemental composition.

We can configure systems to support several types of sputter deposition such as:

  • RF sputtering
  • DC sputtering
  • Pulsed DC sputtering
  • HIPIMs
  • Reactive Sputtering
  • How does sputtering work?

During a sputtering process, ions and electrons generated in the plasma are confined to a designated area closer to the source target by applying a strong magnetic or electrical field. This confinement results in a stronger plasma close to the target material, which increases the frequency of ions colliding with the target, causing a higher rate of deposition. Magnetron sputtering also helps reduce damage that may be caused on the thin film by electrons in the plasma because the magnetic field makes them travel a specific route that avoids collisions with the substrate.

Magnetron sputtering is useful for creating very dense film coatings with increased adhesion. The coating resulting from magnetron sputtering has increased film density due to the high energy bombardment of ions created within a magnetic field in the vacuum chamber.

Out of all the systems I have used, yours is by far the most reliable, consistent and easy to use.

Dr. Marc Baldo – Massachusetts Institute of Technology

dr. marc baldo

Please get in touch and we can collaborate on your project

When we work together, amazing things can happen. Your brilliant ideas with our innovative team will create the tool that will bring your research or production to the next level. We’re looking forward to hearing from you: