Box Coater

Production throughput, big progress.

Box Coater is a flexible, cleanroom-compatible coating platform capable of low to high-volume production, capable of active modelling and correction of film thickness non-uniformity, material yield, and throughput.

Your research goals, production demands, and/or application end goals will inform how to outfit your Box Coater. It is well-suited for a variety of applications, including metallization, optical coatings, sensing, and indium bump bond fabrication.

Let’s work together to design the system that will perfectly suit your requirements.

  • 100 mm - 1200 mm substrates
  • Wide variety of PVD processes
  • Option to be outfitted to achieve ultra-high vacuum (UHV)

SYSTEM BUILD OPTIONS

System Model Features

Sputtering
  • RF, DC, pulsed DC, HIPIMS, and reactive. 
  • Circular, linear & cylindrical cathodes are available.
Thermal Evaporation
  • Utilize a wide range of boats, filaments & crucible heaters.
  • Auto-tuning for precise rate control.
Electron Beam Evaporation
  • Wide range of source power and power supply options available.
  • Programmable sweep controller with recipe storage.
  • Torque sensing crucible indexer detects pocket jams.
  • Option for multiple e-beam sources in the chamber.
Plasma & Ion Beam
  •  A range of ion sources for cleaning and film enhancements, including glow discharge plasma cleaning.

Fixturing & Automation

Explore the enhancements and options that can be added to your EvoVac platform. Creating a system specifically engineered to meet your research and process requirements. These systems can be customized to any degree to meet the user’s application needs using the ideal components as well as precise process development.

 

Substrate Fixturing Enhancements

Substrate and Shadow Mask Automation Options

Advanced Process Control Software

  • PC/PLC-controlled recipes for single, batch, or automated processes.
  • Advanced data logging and process tracking ensure consistent and repeatable processes
  • High-resolution control provides impressive low-rate stability and consistent doping ratios.
  • The central control station manages each module and schedules the processes in each chamber.
  • Independent control of multiple chambers (if applicable).
  • Complex recipes can be created and modified easily.
  • Automatic PID control loop tuning significantly reduces process development time.

Learn more about Aeres®.

Angstrom Engineering® has worked to make their equipment highly functional, but not overly complex to use. Whenever I call I get immediate assistance. In an extremely busy facility like Princeton’s MNFL, these qualities have made Angstrom my first choice for PVD tools.

Joe Palmer
MNFL, Princeton University