Covap
The COVAP PVD platform offers a compact, economical, yet still robust solution for many process applications. Designed for the lab that requires a safe and reliable tool that produces repeatable, high-quality thin films in a compact footprint.
Deposition sources are isolated to reduce thermal effects and cross-contamination. The Covap PVD platform is equipped with a complete set of removable chamber shielding to ensure the chamber can be easily cleaned and maintained.
Source, stage power, and pneumatic pressure are cut while the chamber is open, ensuring the highest level of safety. It can be integrated into a glovebox or selected in a standalone configuration.
Why The COVAP System?
Overview
- Rectangular clam shell chamber for excellent accessibility.
- Materials and substrates can be loaded with ease even in a glovebox.
- Provides unobstructed access for removing shielding, cleaning, and preparing system for the next run.
- Compact 600 mm x 1000 mm system footprint.
- High vacuum provided by turbo-molecular pump.
- QCM sensors carefully isolated to ensure there is no interference from adjacent source material.
- Full system training included.
Features
- Recipe-based advanced multi-layer control.
- Sequential or co-deposition.
- Fixturing supports up to 100mm x 100mm substrates.
- Ready for glove box integration.
Source Configurations
Out of all the systems I have used, yours is by far the most reliable, consistent and easy to use.
Dr. Marc Baldo
Massachusetts Institute of Technology