NEBULA CLUSTER

Angstrom’s pinnacle of automation, engineering precision, user control, and collaboration with you, our partner. These Nebula Cluster integrated vacuum systems are designed specifically to meet our client’s process requirements. The number and type of vacuum modules are customer-selected and provide room for future expansion potential.

Designed for the lab that requires a safe and reliable tool that produces repeatable, high-quality thin films in a compact footprint.

We dream with you to determine the modules that will bring your potential innovations to reality. PVD, CVD, ALD, masking and parking transfer, stages with heating/cooling, sources that assist with cleaning, variable angle deposition and everything else current technology allows.

Build Options

The Nebula Cluster integrated vacuum system includes a centralized robotic hub connecting everything, all controlled with our integrated and simple-to-use recipe-driven software.

Overview

  • Substrate cleaning and preparation using plasma or ion beam sources
  • Multiple vacuum deposition modules are available for PVD, CVD, ALD, & application focused modules, such as Quantum Series
  • Substrate and mask storage cassettes can accommodate 25 or more sample trays as needed
  • Distribution modules using SCARA robots are sized to meet your requirements
  • Glovebox environments can be integrated into one or more modules

Substrate Size/Throughput

  • We have built modules that accommodate standard semiconductor wafer form factors, as well as typical display glass, including modules for Gen. 2 (360 mm x 465 mm) and larger.
  • Throughput depends on process duration and complexity. However, the AERES software platform optimizes layer-to-layer transitions to reduce overall process time.

Nebula Cluster In The Field

This integrated Nebula cluster system was installed at the University of Oxford’s ‘National Thin-Film Facility (NTCF) for Advanced Functional Materials’ to support work in energy production. More here.

Advanced Process Control Software

  • PC/PLC-controlled recipes for single, batch, or automated processes.
  • Advanced data logging and process tracking ensure consistent and repeatable processes.
  • High-resolution control provides impressive low-rate stability and consistent doping ratios.
  • The central control station manages each module and schedules the processes in each chamber.
  • Independent control of multiple chambers (if applicable).
  • Complex recipes can be created and modified easily.
  • Automatic PID control loop tuning significantly reduces process development time.
alt = A screenshot of Angstrom Engineering's AERES software on a monitor. The software is showing a detailed dashboard with charts, graphs, and data for monitoring and controlling thin film deposition processes. The layout has side navigation with equipment status icons and a central graph with real-time data. The interface is designed for precise control and analysis in advanced engineering applications for Angstrom Engineering’s systems.

Learn more about Aeres®.

Dr. Stephen Forrest
University of Michigan

From the time it was delivered, this laboratory system has performed nearly flawlessly, arguably extending our capabilities well beyond those currently attainable by any organic thin film laboratory in the world. I attribute the success of this entire system to the excellence of the engineering as well as the cooperative nature of the Angstrom team in taking our best designs and making them better during the system construction process.