ION Beam Processing
The use of ion beam processing technology is critical to many high performance thin film applications.
How it works.
Processes which utilize ion beam processing include ion beam sputter deposition, ion-assisted deposition, substrate cleaning, etching, and oxidation.
Broad beam ion sources are capable of producing directed beams of singly charged ions with energies ranging from a few eV to 1000 eV.
Ion sources are available in a variety of configurations, including gridded DC and RF ion sources as well as gridless end-hall type sources.
Ion Beam Processing is available on the following platforms.
Configurations & Fixturing Options
This technology is available in various source configurations and is compatible with many Angstrom Engineering® process control capabilities and advanced fixturing options.
Process Control Software
Aeres® Angstrom Engineering's® advanced process control software has been specifically configured with features and capabilities unique to high-performance deposition.
Configurations & Fixturing Options
This technology is available in various source configurations and is compatible with many Angstrom Engineering® process control capabilities and advanced fixturing options.
Process Control Software
Aeres®, Angstrom Engineering's® advanced process control software, has been specifically configured with features and capabilities unique to high-performance deposition.