transparent conductive oxides

Transparent conductive oxides (TCOs) such as indium zinc oxide (IZO) and indium tin oxide (ITO) are critical for advanced optoelectronic applications, where both high optical transparency and low electrical resistance must be achieved simultaneously across large surfaces.

Our team of process specialists and scientists have worked with our partners over the course of decades refining the design and output of deposition fabrication platforms, along with the specialized processes optimized specifically for TCO thin films. Our partners are seeing results with Angstrom Engineering's high-performance, scalable solutions.

Engineering for Uniformity at Scale

In TCO deposition, maintaining uniform film properties across the entire substrate is a critical challenge, one that intensifies as substrate sizes scale up. The difficulty peaks when working with sensitive materials that require strictly low-temperature processing. We design custom sputtering tools specifically optimized to deliver flawless, large-area uniformity wihout relying on high temperatures.

  • Thickness non-uniformity below 5%
  • Sheet resistance non-uniformity below 5%
  • Optical transmittance above 85% at 550 nm

These results are enabled through process-targeted system design, allowing precise control over film uniformity without compromising throughput or efficiency.

transparent conductive oxide uniformity map

Figure 1: Film Thickness Uniformity of IZO ± 0.39 % on a Ø200 mm wafer.

sheet resistance uniformity of tco map

Figure 2: Sheet resistance uniformity of IZO ± 4.45 % on a Ø200 mm wafer.

Figure 3: Transmittance curve of IZO deposited at low temperature on glass

Process Driven Performance

Reactive Gas Management

Process control plays a critical role in achieving high-performance TCO films. In particular reactive gas management is essential for balancing electrical and optical properties. Careful control of gas conditions during deposition directly influences film resistivity, uniformity, and transparency.

sputter plasma low damage sputter

Overcoming the Sputter-Damage Challenge

While magnetron sputtering delivers the dense, uniform, and stoichiometric films that TCO applications demand, its high-energy kinetic bombardment can eaily damage delicate underlying surfaces. This is a critical hurdle when depositing TCOs onto sensitive photoactive layers in photovoltaics, image sensors, and displays. We design custom sputtering tools engineered specifically to mitigate this damage, utilizing advanced plasma control strategies that protect your substrate without sacrificing film quality. Learn more about our damage-mitigation technologies.

Proven Optimization Strategy

Our TCO (Transparent conductive oxide) strategies and solutions are built on a refined optimization methodology that integrates system design with process control. By combining engineered hardware and precise process tuning, we consistently achieve high-performance thin films while maintaining flexibility across applications. We regularly provide equipment and expertise to researchers and engineers in photovoltaics (perovskite), display technologies, touch interface device fabrication, and advanced optoelectronic devices.

TCO optimization is available on a variety of platform form-factors. Talk to us to discuss your research/fabrication requirements.

Advanced Process Control Software

  • PC/PLC-controlled recipes for single, batch, or automated processes.
  • Advanced data logging and process tracking ensure consistent and repeatable processes.
  • High-resolution control provides impressive low-rate stability and consistent doping ratios.
  • The central control station manages each module and schedules the processes in each chamber.
  • Independent control of multiple chambers (if applicable).
  • Complex recipes can be created and modified easily.
  • Automatic PID control loop tuning significantly reduces process development time.
alt = A screenshot of Angstrom Engineering's AERES software on a monitor. The software is showing a detailed dashboard with charts, graphs, and data for monitoring and controlling thin film deposition processes. The layout has side navigation with equipment status icons and a central graph with real-time data. The interface is designed for precise control and analysis in advanced engineering applications for Angstrom Engineering’s systems.

Learn more about Aeres®.

Dr. Peter Lomax
University of Edinburgh, UK

We have an Angstrom Engineering sputter platform, as well as an electron beam evaporation tool. The software has made both systems, which are used for a wide range of materials, simple to use. Furthermore, the ability for the Angstrom team to remotely connect to the software and platform has been particularly useful.  We have been very impressed with the level of communication from Angstrom Engineering, who have kept us informed at all stages of the design and delivery process, offering advice on facilities when needed. Service and support have also been excellent, with very rapid turnaround when ordering materials, which have arrived as quickly as our UK-based vendors.