The PVD (physical vapor deposition), CVD (chemical vapor deposition), and other vacuum systems created by Angstrom Engineering are suitable for a wide variety of applications including thin film deposition research, 2D materials growth such as graphene and nanotubes, industrial coatings, OLED, photovoltaic and Perovskite research. Other offerings cover applications including space simulation and controlled environments for plant growth.
Semi/fully automated cluster
This large, configurable multi-chamber array features a central robot and automation control that allows for the creation of complex multiple substrate recipes with multiple chamber processes without breaking vacuum. The options and configurations are many with processes that are fast, reliable, and repeatable. Various automation levels are available allowing for the creation of devices with unprecedented speed and precision.
Covap PVD Platform
Small but mighty. Covap is our most compact and economical PVD platform, suitable for many process applications. It’s easy to fit into your lab as well as your budget. Approximate substrate maximum: 100mm x 100mm
Nexdep PVD Platform
A compact, economical, and fully featured PVD workhorse. Incredible versatility in a compact footprint. Available with a wide range of deposition source and substrate fixture options. Approximate substrate maximum: 100mm x 100mm
Amod PVD Platform
Not too big, not too small. It’s just right. The Amod chamber size fits in between an EvoVac and a Nexdep. The Amod offers a great balance between capability and budget. Approximate substrate maximum: 150mm x 150mm
Evovac PVD Platform
Anything is possible with this PVD titan. Evovac is our most capable single-chamber PVD platform. It provides the largest chamber for multiple deposition sources, and the most modifiable process tools to ensure your specific research needs are being met precisely. Approximate substrate maximum: 150mm x 150mm
Large chamber sizes, but very quick pumping times. These reliable workhorses can be configured for the chamber size and batch capacity you need.
This system features huge rectangular sputter sources in line and can handle recipes for much larger substrates in automated batches.
Our low pressure chemical vapor deposition (LPCVD) system is designed to meet the high temperature requirements of graphene and CNT research.
Our series of controlled environment space simulation systems allow researchers and aeronautics engineers the ability to test equipment in a variety of atmospheres and temperatures before launch.
Our series of controlled plant growth systems allow biologists the ability to create a variety of pressure environments in which to conduct their research