Glove Box Integration

Angstrom Engineering leads the way in solving PVD process challenges using the controlled atmosphere of a glove box. This integration allows  PVD and non-PVD processes to be connected within a controlled environment. Sensitive materials and substrates can be stored, moved from process to process and tested without exposure to the room environment.

Total integration means that samples, in addition to the evaporated materials, can be loaded from the glovebox.

With a focus on system usability and accessibility, Angstrom Engineering is ready to configure a complete system to meet your space and application requirements.

A controlled environment glovebox attached to a cluster physical vapor deposition pvd thin film vacuum system created by Angstrom Engineering
A controlled environment glovebox attached to a cluster physical vapor deposition pvd thin film vacuum system created by Angstrom Engineering

Solar Simulator

Your glovebox can be integrated with any number of processing and characterization equipment. These can include solar simulators, robotic and manual encapsulation systems, spin coaters, sensitive material storage, and substrate preparation. Because the deposition chamber need only come into contact with inert atmosphere, pumpdown speeds are generally faster, and all fabrication is contained within a more controlled environment, resulting in fewer variables to contend with.

A controlled environment glovebox attached to a cluster physical vapor deposition pvd thin film vacuum system created by Angstrom Engineering

Automated Encapsulation


A controlled environment glovebox attached to a cluster physical vapor deposition pvd thin film vacuum system created by Angstrom Engineering

“At DuPont Displays, OLED displays are being fabricated for a variety of potential applications. Although solution processed displays is the goal, a variety of evaporated OLEDs have also been researched for comparison and controls. The Angstrom Engineering EvoVac evaporator with multiple sources has been invaluable in this regard. Very good film uniformity and rate control can be achieved. Co-deposition from 2 or 3 sources is possible, and the system design is conducive to low compositional variability within the film and from run to run. In-situ mask changes are possible, allowing for multilayer patterned coatings without a vacuum break. The integration of different vapor deposition techniques into one chamber has been especially useful for research.”

Dr. Shiva Prakash, Goleta, USA, Dupont Displays

WE WANT TO HEAR ABOUT YOUR PROCESS! 
Please get in touch and we can collaborate on your project

When we work together, amazing things can happen. Your brilliant ideas with our innovative team will create the tool that will bring your research or production to the next level. We’re looking forward to hearing from you: