Amod Physical Vapor Deposition Platform

This PVD platform begins to allow for larger chamber throw distances, and the ability to accommodate more process enhancements.

Amod Physical vapor deposition pvd evaporator platform

With its 500mm x 500mm baseplate, your Amod physical vapor deposition platform can accommodate up to 8 sources, a wide variety of PVD processes, and can be outfitted to achieve ultra-high vacuum (UHV). Your research goals, production demands, and/or application end-goals will inform how to outfit your Amod PVD platform. Let’s work together to design the system that will be perfectly suited to your requirements.

Not too big, not too small…It’s just right


Electron Beam ebeam e-beam source in a Physical vapor deposition pvd vacuum chamber evaporator
  • Deposition Source Options

Sputtering 
RF, DC, pulsed DC, HIPIMS, and reactive. Circular, linear & cylindrical cathodes are available.

Thermal Evaporation 
With the Amod PVD platform, you can utilize a wide range of boats, filaments & crucible heaters. Auto-tuning ensures precise rate control.

Electron Beam Evaporation 
A wide range of source power and power supply options are available. Programmable sweep controller with recipe storage is controlled through Aeres software platform. A torque sensing crucible indexer detects pocket jams. There is room for multiple e-beam sources in the Amod chamber.

Plasma & Ion Beam Processing 
We use a range of ion sources for cleaning and film enhancements in the Amod physical vapor deposition platform, including glow discharge plasma cleaning.



  • Aeres® Advanced Process Control Software

Screenshot of Aeres, a software platform that supports Angstrom Engineering's Physical vapor deposition systems
  • Simple to use yet highly advanced integrated software platform
  • PC/PLC controlled recipes for single, batch, or automated processes
  • Advanced data logging and process tracking ensure consistent and repeatable processes
  • High resolution control provides impressive low rate stability and consistent doping ratios
  • Central control station manages each module and schedules the processes in each chamber
  • Independent control of multiple chambers (if applicable)
  • Complex recipes can be created and modified easily
  • Automatic PID control loop tuning significantly reduces process development time

The level of service and connectivity to their customers, answering your emails any time of day, and helping you trouble shoot from afar is above and beyond what I had ever seen before. That interaction is what has made me a die-hard customer from here on out.

Dr. Casey Smith – Texas State University


This video demonstrates a process enhancement (masking shutter) that is available on your Amod


WE WANT TO HEAR ABOUT YOUR PROCESS! 
Please get in touch and we can collaborate on your project

When we work together, amazing things can happen. Your brilliant ideas with our innovative team will create the tool that will bring your research or production to the next level. We’re looking forward to hearing from you: