Ion Assisted Deposition
In Ion Assisted Deposition (IAD), an ion source directs a dispersed beam with a range of ion energies toward the substrate. This source typically works along with a sputter or an electron beam source. An inert gas such as argon can be used. Alternatively, if additional chemical reactions during film growth are desired, reactive gases such as oxygen and nitrogen can be used. IAD processes allow advanced process film growth through surface reactions, film density control, and improved adhesion.
Let Angstrom Engineering improve your process capabilities through the addition of an ion source to your system. Angstrom Engineering’s software solutions allow for precise control of these elaborate simultaneous processes.
Ion Assisted Deposition and cleaning are available on most of our systems. Please get in touch with us today to see if it would be ideal for your process.
I have worked closely with Angstrom Engineering on the purchase and installation of three separate deposition/glovebox systems. I can honestly say that my dealings with Angstrom Engineering have been extremely positive and I would have no hesitation in recommending them as a supplier. The quality of their equipment is outstanding. The design and purchase process was extremely smooth, installation was extremely thorough and included very detailed training and lastly, but certainly not least, their after-sales service has been exceptional. They have gone out of their way to assist us in both using and modifying the equipment. Their excellent reputation is thoroughly deserved.
Dr. Scott Watkins – CSIRO – Melbourne, Australia
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